
WHAT IS UCLA_EUV_CDA?
=================
UCLA_EUV_CDA is a tool written in C++ for computing the mask yield of EUV layouts while accounting for EUV mask blank defect avoidance techniques like pattern sift and rotation.   

Currently this tool only gives results for a pre-fitted model that was trained using layout clips from a 32nm Synopsys library that was scaled to 8nm.

AUTHOR
======
Abde Ali Kagalwalla, UCLA
Graduate Student Researcher
NanoCAD Lab, Eng IV, 53-109 
Electrical Engineering Department
University of California, Los Angeles
Phone: (310) 825 - 7154
email:abdeali@ucla.edu


PROJECT DIRECTOR
================
Puneet Gupta, UCLA
Associate Professor
6730C, Boelter Hall,
Box 951594, UCLA,
Los Angeles CA 90095-1594
Phone: (310) 825 - 1376
http://www.ee.ucla.edu/~puneet
email:puneet@ee.ucla.edu


COPYRIGHT NOTICE 
================
Copyright 2009 The Regents of the University of California
All Rights Reserved
Created by Abde Ali Kagalwalla
Electrical Engineering Department, UCLA 


DISCLAIMER
==========
This software is provided "As Is" and without any express or implied
warranties. Neither the authors nor any of their employers (including
any of their subsidiaries and subdivisions) are responsible for maintaining
or supporting this software or for any consequences resulting from the
use of this software even if they arise from flaws in the software.


LICENSE
=======
See file LICENSE in UCLA_EUV_CDA package. 

RELEVANT PUBLICATIONS
=======
A. A. Kagalwalla, M. Lam, K. Adam and P. Gupta, "EUV-CDA: Pattern Shift Aware Critical Density Analysis for EUV Mask Layouts", Proc. IEEE/ACM Asia Pacific Design Automation Conference (ASP-DAC), January 2014. 


CONTENTS
========
File/Directory Name   	  Description
----------------------------------------------------------------------------------
README                    read this file first

LICENSE                   license file

INSTALL			  instructions on how to compile the code and the library dependencies

RUN			  instructions to run the compiled executable with some examples

Makefile		  Makefile for compiling the code

[src]			  Directory containing the source code 
 + *.h/*.cpp      	  Source code 

[data]                  Directory with sample inputs to the program  
 + manf.config		  Sample configuration file with mask manufacturing parameters 
 + testLayouts/s349_syn32nm       	  OpenAccess database of a layout
 + models/syn32nm.mod 	  File containing fitted model

[build]                 Directory where object files generated during compilation are stored

[bin]                    Directory with final executables and scripts for running the tool    


SYSTEM REQUIREMENTS
===================
This software should compile and run on most Unix platforms with a C++ compiler.

BUGS
====
Please send all bug reports to Abde Ali Kagalwalla <abdeali@ucla.edu>.

ACKNOWLEDGEMENTS
================
This work is partly supported by IMPACT, SRC, and NSF. 
